material

SiO2
ID:

mp-556985
DOI:

10.17188/1269638

Tags: Silicon dioxide

Material Details

Final Magnetic Moment
0.000 μB

Calculated total magnetic moment for the unit cell within the magnetic ordering provided (see below). Typically accurate to the second digit.
Magnetic Ordering
NM
Formation Energy / Atom
-3.223 eV

Calculated formation energy from the elements normalized to per atom in the unit cell.

Energy Above Hull / Atom
0.044 eV

The energy of decomposition of this material into the set of most stable materials at this chemical composition, in eV/atom. Stability is tested against all potential chemical combinations that result in the material's composition. For example, a Co2O3 structure would be tested for decomposition against other Co2O3 structures, against Co and O2 mixtures, and against CoO and O2 mixtures.

Density
1.94 g/cm3

The calculated bulk crystalline density, typically underestimated due calculated cell volumes overestimated on average by 3% (+/- 6%)

Decomposes To
SiO2
Band Gap
5.834 eV

In general, band gaps computed with common exchange-correlation functionals such as the LDA and GGA are severely underestimated. Typically the disagreement is reported to be ~50% in the literature. Some internal testing by the Materials Project supports these statements; typically, we find that band gaps are underestimated by ~40%. We additionally find that several known insulators are predicted to be metallic.

Space Group

Hermann Mauguin
P1 [1]
Hall
P 1
Point Group
1
Crystal System
triclinic

Electronic Structure

Band Structure and Density of States

Warning! Semi-local DFT tends to severely underestimate bandgaps. Please see the wiki for more info.

X-Ray Diffraction

    Select radiation source:
  • Cu
  • Ag
  • Mo
  • Fe

Calculated powder diffraction pattern; note that peak spacings may be affected due to inaccuracies in calculated cell volume, which is typically overestimated on average by 3% (+/- 6%)

X-Ray Absorption Spectra

FEFF XANES

Select an element to display a spectrum averaged over all sites of that element in the structure.

Apply Gaussian smoothing:

0 eV
3 eV
FWHM: 0 eV

Download spectra for every symmetrically equivalent absorption site in the structure.

Download FEFF Input parameters.

Warning: These results are intended to be semi-quantitative in that corrections, such as edge shifts and Debye-Waller damping, have not been included.

Substrates

Reference for minimal coincident interface area (MCIA) and elastic energy:
substrate orientation:
No elastic tensor calculated for this material, so elastic energies not avaialable. Sorting by MCIA instead.
substrate material substrate orientation film orientation MCIA† [Å2]
LaAlO3 (mp-2920) <0 0 1> <1 1 0> 198.9
AlN (mp-661) <0 0 1> <0 1 -1> 207.6
CeO2 (mp-20194) <1 0 0> <0 0 1> 237.8
BaF2 (mp-1029) <1 0 0> <0 0 1> 271.8
BaF2 (mp-1029) <1 1 0> <0 0 1> 271.8
GaN (mp-804) <0 0 1> <0 1 0> 136.7
GaN (mp-804) <1 0 0> <1 0 -1> 230.2
GaN (mp-804) <1 0 1> <1 -1 -1> 57.5
SiO2 (mp-6930) <0 0 1> <0 1 0> 239.2
SiO2 (mp-6930) <1 0 0> <1 0 -1> 230.2
SiO2 (mp-6930) <1 1 0> <0 1 0> 341.7
SiO2 (mp-6930) <1 1 1> <1 1 0> 265.2
InAs (mp-20305) <1 1 0> <1 1 0> 265.2
LiF (mp-1138) <1 0 0> <1 0 -1> 322.3
LiF (mp-1138) <1 1 0> <0 0 1> 305.7
Te2W (mp-22693) <0 0 1> <0 1 0> 170.8
Te2W (mp-22693) <0 1 0> <1 0 -1> 322.3
Te2W (mp-22693) <0 1 1> <1 0 0> 230.3
Te2W (mp-22693) <1 0 0> <0 1 1> 293.5
YVO4 (mp-19133) <0 0 1> <1 1 0> 265.2
Te2Mo (mp-602) <0 0 1> <1 1 0> 66.3
AlN (mp-661) <1 0 0> <0 1 0> 205.0
AlN (mp-661) <1 0 1> <0 1 1> 176.1
AlN (mp-661) <1 1 0> <0 1 -1> 103.8
AlN (mp-661) <1 1 1> <0 0 1> 169.9
Te2Mo (mp-602) <1 0 0> <1 0 -1> 322.3
Te2Mo (mp-602) <1 0 1> <1 0 0> 230.3
Ag (mp-124) <1 0 0> <1 0 -1> 138.1
Ag (mp-124) <1 1 0> <1 1 0> 198.9
CeO2 (mp-20194) <1 1 0> <1 -1 -1> 287.6
Bi2Te3 (mp-34202) <0 0 1> <0 1 1> 293.5
GaN (mp-804) <1 1 0> <0 0 1> 203.8
GaN (mp-804) <1 1 1> <0 1 0> 273.4
GaSe (mp-1943) <0 0 1> <0 0 1> 339.7
GaSe (mp-1943) <1 0 0> <1 0 0> 138.2
KCl (mp-23193) <1 0 0> <0 0 1> 271.8
GaSe (mp-1943) <1 0 1> <1 -1 -1> 287.6
DyScO3 (mp-31120) <0 0 1> <0 0 1> 271.8
DyScO3 (mp-31120) <0 1 0> <0 1 -1> 173.0
DyScO3 (mp-31120) <1 1 0> <1 0 0> 184.3
InAs (mp-20305) <1 0 0> <0 0 1> 271.8
BN (mp-984) <0 0 1> <1 1 -1> 114.3
BN (mp-984) <1 0 0> <0 0 1> 237.8
BN (mp-984) <1 0 1> <0 0 1> 237.8
KTaO3 (mp-3614) <1 0 0> <1 0 -1> 276.3
KTaO3 (mp-3614) <1 1 0> <0 0 1> 305.7
BN (mp-984) <1 1 0> <1 1 -1> 228.7
BN (mp-984) <1 1 1> <1 0 -1> 322.3
LiNbO3 (mp-3731) <0 0 1> <0 1 0> 307.5
LiNbO3 (mp-3731) <1 0 0> <0 1 0> 307.5
Up to 50 entries displayed.
†minimal coincident interface area.

Elasticity

A full elastic tensor has not been calculated for this material. Registered users can view statistical-learning-based predictions of this material's bulk and shear moduli.

Once you have registered you can also "vote" for full calculation of this material's elastic properties.

Piezoelectricity

Reference for tensor and properties: Methodology
Piezoelectric Tensor eij (C/m2)
0.09303 0.00348 0.01300 0.01119 -0.02428 0.03062
0.12597 0.02143 -0.01402 0.01028 0.02956 -0.00572
-0.07379 -0.05407 -0.05625 -0.00771 -0.02888 0.01823
Piezoelectric Modulus ‖eij‖max
0.18204 C/m2
Crystallographic Direction vmax
-1.00000
1.00000
-1.00000

Dielectric Properties

Reference for tensor and properties: Methodology
Dielectric Tensor εij∞ (electronic contribution)
2.11 0.01 -0.03
0.01 2.07 0.00
-0.03 0.00 2.00
Dielectric Tensor εij (total)
3.68 0.06 -0.16
0.06 3.57 0.03
-0.16 0.03 3.16
Polycrystalline dielectric constant εpoly∞
(electronic contribution)
2.06
Polycrystalline dielectric constant εpoly
(total)
3.47
Refractive Index n
1.44
Potentially ferroelectric?
Unknown

Similar Structures beta feature

Explanation of dissimilarity measure: Documentation.
material dissimilarity Ehull # of elements
CoSiO4 (mp-633897) 0.5514 0.213 3
BeCrO4 (mp-770887) 0.5250 0.012 3
Be(PO3)2 (mp-27588) 0.6193 0.000 3
AlPO4 (mp-558088) 0.4709 0.025 3
AlPO4 (mp-667310) 0.4968 0.022 3
CsSi3HO7 (mp-758180) 0.5260 0.002 4
CsSi2HO5 (mp-557780) 0.6971 0.005 4
KAlSi3O8 (mp-697670) 0.7473 0.000 4
SiO2 (mp-556994) 0.2834 0.083 2
SiO2 (mp-557873) 0.1960 0.060 2
SiO2 (mp-558569) 0.2471 0.073 2
CeSe2 (mp-1080255) 0.1778 0.509 2
CrN2 (mp-1096886) 0.2239 0.417 2
RbB2P2HO9 (mp-758281) 0.6793 0.000 5
Up to 5 similar elemental, binary, ternary, quaternary, etc. structures displayed (dissimilarity threshold 0.75). Ehull: energy above hull per atom [eV].

Synthesis Descriptions

10.1007/bf00248171
Sol-gel TiO2-SiO2 films were deposited on 316L stainless steel by dip coating process from a sono-catalysed sol of composition 30TiO2-70SiO2 prepared from a mixture of Ti(OC2H5)4 and Si(OC2H5)4, absol [...]
10.1007/s10853-012-6597-6
Bisphenol A polycarbonate (Makrolon RX 1805) from Bayer MaterialScience AG (Germany) was used as polymer matrix. A type of hydrophobic nano-SiO2 (Aerosil R8200) was chosen as filler, which was supplie [...]
chef hat mixing beaker

Explore more synthesis descriptions for materials of composition SiO2.

Text computed by synthesisproject.org.

Calculation Summary

Structure Optimization

Run Type
GGA
Energy Cutoff
520 eV
# of K-points
None
U Values
--
Pseudopotentials
VASP PAW: Si O
Final Energy/Atom
-7.8721 eV
Corrected Energy
-99.9607 eV
Uncorrected energy = -94.4647 eV Composition-based energy adjustment (-0.687 eV/atom x 8.0 atoms) = -5.4960 eV Corrected energy = -99.9607 eV

Detailed input parameters and outputs for all calculations

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ICSD IDs
  • 75656
Submitted by
User remarks:
  • Silicon dioxide

Displaying lattice parameters for primitive cell; note that calculated cell volumes are typically overestimated on average by 3% (+/- 6%). Note the primitive cell may appear less symmetric than the conventional cell representation (see "Structure Type" selector below the 3d structure)